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GAIA3 model 2016

GAIA3 model 2016 is the ideal platform for performing the most challenging nanoengineering applications that require ultimate precision and demanding capabilities for microanalysis. The preparation of high-quality ultra-thin TEM lamella, delayering processes in technology nodes, precise nanopatterning or high-resolution 3D reconstructions are just some of the applications in which GAIA3 excels.
Such features make GAIA3 model 2016 the ideal instrument for applications in which imaging at low beam energies is a requirement to preserve delicate structures in the samples that can get easily damaged by the electron beam such as low-k dielectric materials, photoresists or uncoated biological specimens. In terms of sample modification, GAIA3 model 2016 represents the most suitable solution for challenging nano machining and nanofabrication.

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